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Article overview
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Sub-mu m Josephson Junctions for Superconducting Quantum Devices | | J. M. Meckbach
; M. Merker
; S. J. Buehler
; K. Ilin
; B. Neumeier
; U. Kienzle
; E. Goldobin
; R. Kleiner
; D. Koelle
; M. Siegel
; | | Date: |
3 Oct 2012 | | Abstract: | For high-performance superconducting quantum devices based on Josephson
junctions (JJs) decreasing lateral sizes is of great importance. Fabrication of
sub-mu m JJs is challenging due to non-flat surfaces with step heights of up
to several 100 nm generated during the fabrication process. We have refined a
fabrication process with significantly decreased film thicknesses, resulting in
almost flat surfaces at intermediate steps during the JJ definition. In
combination with a mix-&-match process, combining electron-beam lithography
(EBL) and conventional photolithography, we can fabricate JJs with lateral
dimensions down to 0.023 mu m^2. We propose this refined process as an
alternative to the commonly used chemical-mechanical polishing (CMP) procedure.
We present transport measurements of JJs at 4.2 K that yield critical-current
densities in the range from 50 to 10^4 A/cm^2. Our JJ process yields excellent
quality parameters, Rsg/Rn up to ~50 and Vgap up to 2.81 mV, and also allows
the fabrication of high-quality sub-mu m wide long JJs (LJJs) for the study of
Josephson vortex behavior. The developed technique can also be used for similar
multilayer processes and is very promising for fabricating sub-mu m JJs for
quantum devices such as SQUIDs, qubits and SIS mixers. | | Source: | arXiv, 1210.1012 | | Services: | Forum | Review | PDF | Favorites | |
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