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24 April 2024 |
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Rapid CVD growth of millimetre-sized single crystal graphene using a cold-wall reactor | | Vaidotas Miseikis
; Domenica Convertino
; Neeraj Mishra
; Mauro Gemmi
; Torge Mashoff
; Stefan Heun
; Niloofar Haghighian
; Francesco Bisio
; Maurizio Canepa
; Vincenzo Piazza
; Camilla Coletti
; | | Date: |
26 Jan 2015 | | Abstract: | In this work we present a simple pathway to obtain large single-crystal
graphene on copper (Cu) foils with high growth rates using a commercially
available cold-wall chemical vapour deposition (CVD) reactor. We show that
graphene nucleation density is drastically reduced and crystal growth is
accelerated when: i) using ex-situ oxidised foils; ii) performing annealing in
an inert atmosphere prior to growth; iii) enclosing the foils to lower the
precursor impingement flux during growth. Growth rates as high as 14.7 and 17.5
micrometers per minute are obtained on flat and folded foils, respectively.
Thus, single-crystal grains with lateral size of about one millimetre can be
obtained in just one hour. The samples are characterised by optical microscopy,
scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS),
Raman spectroscopy as well as selected area electron diffraction (SAED) and
low-energy electron diffraction (LEED), which confirm the high quality and
homogeneity of the films. The development of a process for the quick production
of large grain graphene in a commonly used commercial CVD reactor is a
significant step towards an increased accessibility to millimetre-sized
graphene crystals. | | Source: | arXiv, 1501.6356 | | Services: | Forum | Review | PDF | Favorites | |
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