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Spin mediated dissipation and frequency shifts of a cantilever at milliKelvin temperatures | | A. M. J. den Haan
; J. J. T. Wagenaar
; J. M. de Voogd
; G. Koning
; T. H. Oosterkamp
; | | Date: |
3 Sep 2015 | | Abstract: | We measure the dissipation and frequency shift of a magnetically coupled
cantilever in the vicinity of a silicon chip, down to 25 mK. The dissipation
and frequency shift originates from the interaction with the unpaired
electrons, associated with the dangling bonds in the native oxide layer of the
silicon, which form a two dimensional system of electron spins. We approach the
sample with a 3.43 um-diameter magnetic particle attached to an ultrasoft
cantilever, and measure the frequency shift and quality factor as a function of
temperature and the distance. Using a recent theoretical analysis [1] of the
dynamics of a system consisting of a spin and a magnetic resonator, we are able
to fit the data and extract the relaxation time $T_1=0.20pm0.04$ ms and spin
density $sigma=0.15pm0.01$ spins per nm$^2$. Our analysis shows that at
temperatures < 500 mK magnetic dissipation is an important source of
non-contact friction. | | Source: | arXiv, 1509.1251 | | Services: | Forum | Review | PDF | Favorites | |
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