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Article overview
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Roughness-induced domain structure in perpendicular Co/Ni multilayers | N. R. Lee-Hone
; R. Thanhoffer
; V. Neu
; R. Schäfer
; M. Arora
; R. Hübner
; D. Suess
; D. M. Broun
; E. Girt
; | Date: |
14 Dec 2016 | Abstract: | We investigate the correlation between roughness, remanence and coercivity in
Co/Ni films grown on Cu seed layers of varying thickness. Increasing the Cu
seed layer thickness of Ta/Cu/8x[Co/Ni] thin films increases the roughness of
the films. In-plane magnetization loops show that both the remanance and
coercivity increase with increasing seed layer roughness. Polar Kerr microscopy
and magnetic force microscopy reveal that the domain density also increases
with roughness. Finite element micromagnetic simulations performed on
structures with periodically modulated surfaces provide further insight. They
confirm the connection between domain density and roughness, and identify the
microsocpic structure of the domain walls as the source of the increased
remanence in rough films. The simulations predict that the character of the
domain walls changes from Bloch-like in smooth films to N’eel-like for rougher
films. | Source: | arXiv, 1612.4867 | Services: | Forum | Review | PDF | Favorites |
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