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25 April 2024
 
  » arxiv » 1707.5693

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Growth exponents of the etching model in high dimensions
Evandro A Rodrigues ; Bernardo A Mello ; Fernando A Oliveira ;
Date 18 Jul 2017
AbstractIn this work we generalize the etching model (Mello et al 2001 Phys. Rev. E 63 041113) to d + 1 dimensions. The dynamic exponents of this model are compatible with those of the Kardar-Parisi-Zhang universality class. We investigate the roughness dynamics with surfaces up to d=6. We show that the data from all substrate lengths and for all dimensions can be collapsed into one common curve. We determine the dynamic exponents as a function of the dimension. Moreover, our results suggest that d=4 is not an upper critical dimension for the etching model, and that it fulfills the Galilean invariance.
Source arXiv, 1707.5693
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