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25 April 2024
 
  » arxiv » cond-mat/0403043

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Dynamical Model for Chemically Driven Running Droplets
Uwe Thiele ; Karin John ; Markus Bär ;
Date 1 Mar 2004
Journal Phys. Rev. Lett. 93, 027802 (2004) DOI: 10.1103/PhysRevLett.93.027802
Subject Soft Condensed Matter; Chemical Physics | cond-mat.soft physics.chem-ph
AbstractWe propose coupled evolution equations for the thickness of a liquid film and the density of an adsorbate layer on a partially wetting solid substrate. Therein, running droplets are studied assuming a chemical reaction underneath the droplets that induces a wettability gradient on the substrate and provides the driving force for droplet motion. Two different regimes for moving droplets -- reaction-limited and saturated regime -- are described. They correspond to increasing and decreasing velocities with increasing reaction rates and droplet sizes, respectively. The existence of the two regimes offers a natural explanation of prior experimental observations.
Source arXiv, cond-mat/0403043
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