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New cellular automaton designed to simulate epitaxial films growth | | R.Kosturek
; K.Malarz
; | | Date: |
28 Jun 2004 | | Journal: | Physica A345 (2005) 538 DOI: 10.1016/j.physa.2004.08.013 | | Subject: | Materials Science; Cellular Automata and Lattice Gases | cond-mat.mtrl-sci nlin.CG | | Affiliation: | AGH-UST | | Abstract: | In this paper a simple (2+1) solid-on-solid model of the epitaxial films growth based on random deposition followed by breaking particle-particle lateral bonds and particles surface diffusion is introduced. The influence of the critical number of the particle-particle lateral bonds $z$ and the deposition rate on the surface roughness dynamics and possible surface morphology anisotropy is presented. The roughness exponent $alpha$ and the growth exponent $eta$ are $(0.863,0.357)$, $(0.215,0.123)$, $(0.101,0.0405)$ and $(0.0718,0.0228)$ for $z=1$, 2, 3 and 4, respectively. Snapshots from simulations of the growth process are included. | | Source: | arXiv, cond-mat/0406677 | | Services: | Forum | Review | PDF | Favorites | |
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