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Sharp-Interface Limit of a Fluctuating Phase-Field Model | | R. Ben’{i}tez
; L. Ram’{i}rez-Piscina
; | | Date: |
28 Sep 2004 | | Subject: | Materials Science; Statistical Mechanics | cond-mat.mtrl-sci cond-mat.stat-mech | | Abstract: | We present a derivation of the sharp-interface limit of a generic fluctuating phase-field model for solidification. As a main result, we obtain a sharp-interface projection which presents noise terms in both the diffusion equation and in the moving boundary conditions. The presented procedure does not rely on the fluctuation-dissipation theorem, and can therefore be applied to account for both internal and external fluctuations in either variational or non-variational phase-field formulations. In particular, it can be used to introduce thermodynamical fluctuations in non-variational formulations of the phase-field model, which permit to reach better computational efficiency and provide more flexibility for describing some features of specific physical situations. This opens the possibility of performing quantitative phase-field simulations in crystal growth while accounting for the proper fluctuations of the system. | | Source: | arXiv, cond-mat/0409707 | | Services: | Forum | Review | PDF | Favorites | |
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