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26 April 2024

» arxiv » 1304.4629

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Effect of annealing on the superconducting properties of a-Nb(x)Si(1-x) thin films
O. Crauste ; A. Gentils ; F. Couëdo ; Y. Dolgorouky ; L. Bergé ; S. Collin ; C. A. Marrache-Kikuchi ; L. Dumoulin ;
Date:	16 Apr 2013
Abstract:	a-Nb(x)Si(1-x) thin films with thicknesses down to 25 {AA} have been structurally characterized by TEM (Transmission Electron Microscopy) measurements. As-deposited or annealed films are shown to be continuous and homogeneous in composition and thickness, up to an annealing temperature of 500{deg}C. We have carried out low temperature transport measurements on these films close to the superconductor-to-insulator transition (SIT), and shown a qualitative difference between the effect of annealing or composition, and a reduction of the film thickness on the superconducting properties of a-NbSi. These results question the pertinence of the sheet resistance R_square as the relevant parameter to describe the SIT.
Source:	arXiv, 1304.4629
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