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Nanolithography with metastable helium atoms in a high-power standing-wave light field | | S.J.H. Petra
; L. Feenstra
; W. Hogervorst
; W. Vassen
; | | Date: |
19 Aug 2003 | | Journal: | Appl. Phys. B 78 (2), 133-136 (2004) DOI: 10.1007/s00340-003-1371-8 | | Subject: | Atomic Physics | physics.atom-ph | | Abstract: | We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely cooled and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10E7) increases the confinement of the atoms in the standing-wave considerably, and makes the alignment of the experimental setup less critical. Due to the high internal energy of the metastable helium atoms (20 eV), a dose of only one atom per resist molecule is required. With an exposure time of only eight minutes, parallel lines with a separation of 542 nm and a width of 100 nm (1/11th of the wavelength used for the optical mask) are created. | | Source: | arXiv, physics/0308076 | | Services: | Forum | Review | PDF | Favorites | |
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