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27 April 2024
 
  » arxiv » cond-mat/0606071

 Article overview



High-mobility AlAs quantum wells with out-of-plane valley occupation
K. Vakili ; Y. P. Shkolnikov ; E. Tutuc ; E. P. De Poortere ; M. Padmanabhan ; M. Shayegan ;
Date 2 Jun 2006
Subject Mesoscopic Systems and Quantum Hall Effect
AbstractEmploying state-of-the-art molecular beam epitaxy techniques to grow thin, modulation-doped AlAs quantum wells, we have achieved a low temperature mobility of 5.5 m$^2$/Vs with out-of-plane occupation, an order of magnitude improvement over previous studies. However, due to the narrow well width, mobilities are still limited by scattering due to interface roughness disorder. We demonstrate the successful implementation of a novel technique utilizing thermally-induced, biaxial, tensile strain that forces electrons to occupy the out-of-plane valley in thicker quantum wells, reducing interface roughness scattering and allowing us to achieve mobilities as high as 8.8 m$^2$/Vs.
Source arXiv, cond-mat/0606071
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